Construction of a High Frequency and High Reflectance Shutter for a Direct Write EUV Lithography System. International Journal of Automation and Smart Technology, [S. l.], v. 3, n. 2, p. 107–115, 2013. DOI: 10.5875/ausmt.v3i2.189. Disponível em: https://jausmt.org/index.php/jausmt/article/view/287.. Acesso em: 16 may. 2026.